Varian Semiconductor Equipment Associates, Inc. announced today that it has received a follow-on order for its VIISta 80HP high current ion implanter from ProMOS Technologies, Inc.
ProMOS ordered the system for its mass production 300mm DRAM fab in Hsinchu City, Taiwan, keeping its commitment to Varian Semiconductor's single wafer, ribbon beam technology in its high current ion implanter processes.
The VIISta platform of ion implanters exceeds 300 wafers per hour, making it the fastest ion implanter platform available. All of the VIISta products feature the Varian Control System (VCS), the Varian Positioning System (VPS), and a common single wafer endstation. This high degree of commonality across the VIISta platform facilitates process matching throughout the tool set and provides flexibility in managing capacity, product mix changes, spare parts and training.